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Electronic transport properties in aluminum indium nitride nanorods grown by magnetron sputter epitaxy

机译:磁控溅射外延生长铝氮化铟纳米棒中的电子输运性质

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摘要

The electronic transport properties of the wide-bandgap aluminum indium nitride (AlInN) nanorods (NRs) grown by ultrahigh-vacuum magnetron sputter epitaxy (MSE) have been studied. The conductivities of the ternary compound nanostructure locates at the value of 15 Q-1 cm -1, which is respectively one and two orders of magnitude lower than the binary GaN and InN counterparts grown by chemical vapor deposition (CVD). The very shallow donor level/band with the activation energy at 11 + 2 meV was obtained by the temperature-dependent measurement. In addition, the photoconductivity has also been investigated. The photoconductive (PC) gain of the NRs device can reach near 2400 under a low bias at 0.1 V and the light intensity at 100W m-2 for ultraviolet response in vacuum. The power-insensitive gain and ambience-dependent photocurrent are also observed, which is attributed to the probable surfacecontrolled PC mechanism in this ternary nitride nanostructure.
机译:研究了超高真空磁控溅射外延(MSE)生长的宽带隙氮化铝铟(AlInN)纳米棒(NRs)的电子传输性能。三元化合物纳米结构的电导率位于15 Q-1 cm -1的值,分别比通过化学气相沉积(CVD)生长的二元GaN和InN对应物低一个和两个数量级。通过与温度有关的测量获得了非常浅的供体能级/带,其激活能为11 + 2 meV。另外,还研究了光电导性。 NRs器件的光电导(PC)增益在0.1 V的低偏压和100W m-2的光强度下在真空下的紫外线响应下可达到2400附近。还观察到功率不敏感的增益和与环境有关的光电流,这归因于这种三元氮化物纳米结构中可能的表面控制的PC机制。

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